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(Invited) Doping Silicon Dielectrics with Silicon, Cerium and Oxygen Via Ion Implantation

Tuesday, May 14, 2013: 14:00
Conference Room F, Mezzanine Level (Sheraton)
A. P. Knights , McMaster University, Hamilton, ON, Canada
Rachel M. Savidge , McMaster University
Matthew P. Halsall , The University of Manchester, Manchester, United Kingdom
Iain Forbes Crowe , The University of Manchester

Abstract:

See more of: Doping Issues
See more of: E3: Nanocrystal Embedded Dielectrics for Electronic and Photonic Devices
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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