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Comparison of Resistive Switching between Tantalum Oxides Deposited by Atomic Layer Deposition and E-Beam Physical Vapor Evaporation

Tuesday, May 14, 2013: 16:40
Churchill Room, Second Floor (Sheraton)
Marius K. Orlowski, Ph.D. , Virginia Tech, Bradley Department of Electrical and Computer Engineering, Virginia Polytechnic Institute and State University, Blacksburg, VA
Yuhong Kang , Virginia Tech, Bradley Department of Electrical and Computer Engineering, Virginia Polytechnic Institute and State University, Blacksburg, VA
Tong Liu , Virginia Polytechnic Institute and State University
Tanmay Potnis , Virginia Tech

Abstract:

See more of: Materials Synthesis and Characterization
See more of: A2: Nanotechnology General Session
See more of: General Topics
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