Optoelectronics and Power Devices

Wednesday, May 15, 2013: 08:30-12:10
Provincial Ballroom North, Second Floor (Sheraton)
Chairs:
Krishna Shenai, PhD and Sjoerd Hoogland
08:30
757
Colloidal Quantum Dot Photodetectors
Sjoerd Hoogland, University of Toronto; Edward H Sargent, University of Toronto
09:00
758
(Invited) Indirect Conversion Digital X-Ray Imager Using an Amorphous Selenium Photoconductor
Shiva Abbaszadeh, Electrical and Computer Engineering, University of Waterloo; Rasoul Keshavarzi, Electrical and Computer Engineering, University of Waterloo; Kai Wang, Electrical and Computer Engineering, University of Waterloo; Karim S Karim, Center for Bioengineering and Biotechnology, University of Waterloo
09:30
759
ALD HfO2 and Al2O3 as MIM Capacitor Dielectric for GaAs HBT Technology
Jiro Yota, Ph.D., Skyworks Solutions, Inc.
09:50
Coffee Break
10:10
760
Post Silicon Power Semiconductor Devices
Krishna Shenai, PhD, Argonne National Laboratory
10:40
761
Scalable Production of Nanowire Arrays and Powders Using Plasmas
Mahendra Kumar Sunkara, Ph.D., University of Louisville; Tu Nguyen, University of Louisville
11:00
762
Effect of Different Patterns Epitaxial Lift-Off Process by Finite Element Method
Ray-Hua Horng, Dr., Graduate Institute of Precision Engineering, National Chung Hsing University; Fan-Lei Wu, National Chung Hsing University; Sin-Liang Ou, National Chung Hsing University; Fang-Ching Liu, National Chung Hsing University; Ming-Tzer Lin, National Chung Hsing University; C. H. Lu, National Chung Hsing University; Yu-Cheng Kao, National Chung Hsing University; Dong-Sing Wuu, Dr., Department of Materials Science and Engineering, National Chung Hsing University
11:20
763
Novel Cross-Linked Ortho-Carborane and Ortho-Carborane:Y (Y=1,4-Diaminobenzene, Pyridine, Benzene) Polymer Films: A New Class of Carborane-Based Materials with  Tunable Electronic Structure
Frank L Pasquale, University of North Texas; Robinson James, University of North Texas; Raymond Welch, University of North Texas; Elena Echeverria, University of Nebraska-Lincoln; Peter A. Dowben, University of Nebraska-Lincoln; Jeffry A. Kelber, University of North Texas
See more of: E2: Graphene, Ge/III-V, and Emerging Materials for Post CMOS Applications 5
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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