H4: Electronic Properties and Applications
Tuesday, May 14, 2013: 14:00-18:00
Civic Ballroom North, Second Floor (Sheraton)
Chairs:
Philip G. Collins
and
Mark C Hersam
14:20
DWNT as Active Electrode in Far-IR and THz Optical Modulation Devices
Philippe Gagnon, Regroupement Québécois sur les Matériaux de Pointe (RQMP);
Maxime Biron, Regroupement Québécois sur les Matériaux de Pointe (RQMP);
Patrick Desjardins, Ph.D., Regroupement Québécois sur les Matériaux de Pointe (RQMP);
Richard Martel, Ph.D., Regroupement Québécois sur les Matériaux de Pointe (RQMP)
15:40
(Invited) Single Molecule Enzymology Using Carbon Nanotube Circuits
Yongki Choi, University of California, Irvine;
Patrick C. Sims, University of California, Irvine;
Tivoli Olsen, University of California, Irvine;
O. Tolga Gul, University of California, Irvine;
Brad L. Corso, University of California, Irvine;
Mariam Iftikhar, University of California, Irvine;
Gregory A. Weiss, University of California, Irvine;
Philip G. Collins, University of California, Irvine
16:20
Disorder-Induced Electron-Phonon Interactions and Gap States in Carbon Nanotubes
François Lapointe, Regroupement Québécois sur les Matériaux de Pointe (RQMP);
Delphine Bouilly, Regroupement Québécois sur les Matériaux de Pointe (RQMP);
Minh Nguyen, Regroupement Québécois sur les Matériaux de Pointe (RQMP);
Étienne Gaufrès, Ph.D., Regroupement Québécois sur les Matériaux de Pointe (RQMP);
Nathalie Y-Wa Tang, Ph.D., Regroupement Québécois sur les Matériaux de Pointe (RQMP);
Patrick Desjardins, Ph.D., Regroupement Québécois sur les Matériaux de Pointe (RQMP);
Richard Martel, Ph.D., Regroupement Québécois sur les Matériaux de Pointe (RQMP)
17:20
Monolithic Integration of Micro-Capacitors by Lithographically Patternable, Wafer-Scale Single-Walled Carbon Nanotube Film
Kazufumi Kobashi, National institute of advanced industrial science and technology;
Karolina U. Laszczyk, National institute of advanced industrial science and technology;
Atsuko Sekiguchi, National institute of advanced industrial science and technology;
Fumiaki Tanaka, National institute of advanced industrial science and technology;
Chandramouli Subramaniam, National institute of advanced industrial science and technology;
Don N. Futaba, National institute of advanced industrial science and technology;
Takeo Yamada, National institute of advanced industrial science and technology;
Kenji Hata, National institute of advanced industrial science and technology
