Comparison of Ta, Pt and Ti Capping Layer On Perpendicular Magnetic Anisotropy in Cofeb-MgO-Cofeb Magnetic-Tunnel-Junction

1998
Comparison of Ta, Pt and Ti Capping Layer On Perpendicular Magnetic Anisotropy in Cofeb-MgO-Cofeb Magnetic-Tunnel-Junction

Wednesday, October 30, 2013: 15:20

Golden Gate 1, Tower 3, Lobby Level (Hilton San Francisco Union Square)

Seung-Eun Lee, B.S. , Hanyang University, Seoul, South Korea

Du-Yeong Lee, M.S. , Hanyang University, Seoul, South Korea

Min-Su Jeon, B.S. , Hanyang University, Seoul, South Korea

Yasutaka Takemura, M.S. , SUMCO Corporation

Kyo-suk Chae, M.S. , Samsung Electronics Co., Ltd., Seoul, South Korea

Tae-Hun Shim, Ph.D. , Hanyang University

Jea-Gun Park, PhD , Hanyang University, Seoul, South Korea

Abstract: