530
An AFM Evaluation of Rhenium-Nickel Electrodeposit Nucleation on Copper
Galvanostatic pulse methods were used to electrodeposit pure nickel and pure rhenium salts separately from citrate solutions on (111) single crystal copper substrates as well as mica-supported copper films. The results are compared with the electrodeposition behavior of Re-Ni bath mixtures. A very small time scale is needed to deposit a monolayer of nickel. Distinct differences in frictional force of the initial deposit nuclei was captured by AFM. Figure 1 shows the difference in frictional force between a bare copper surface (111) and nickel deposit on a copper (111) surface. Nickel was deposited electrochemically by exposing a copper surface (111) to a 96 mM nickel sulfamate solution under galvanostatic polarization for 1 ms at -53.0 mA/cm2. The spots observed in the frictional image are attributed to islands of nickel atoms that are too thin to be detected in the topography mode.
Acknowledgements
The authors gratefully acknowledge the financial support from AFOSR under grant FA9550-10-1-0520.
References
1) S. Szabó and I. Bakos, J. Electroanal. Chem., 492, 103 (2000).
2) A. Naor, N. Eliaz, and E. Gileadi, Electrochim. Acta, 54, 6028 (2009).
3) A. Naor, N. Eliaz, L. Burstein, and E. Gileadi, Electrochem. and Solid-State Letters, 13, D91 (2010).
4) A. Naor, N. Eliaz, and E. Gileadi, J. Electrochem. Soc., 157, D442 (2010).
5) E. Méndez, M. F. Cerdá, A. M. Castro Luna, C. F. Zinola, C. Kremer, and María E. Martins, J. Colloid. Int. Sci., 263, 119 (2003).
6) L. E. Netherton and M. L. Holt, J. Electrochem. Soc., 99, 44 (1954).
7) A. Vargas-Uscategui, E. Mosquera and L. Cifuentes, Electrochim. Acta, 109, 283 (2013).
8) A. Duhin, A. Inberg, N. Eliaz, and E. Gileadi, Electrochim. Acta, 56, 9637 (2011).