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Invited; Light Induced Degradation in Compensated B-Doped Czochralski Silicon
In this presentation, we will report our recent work about LID in B-doped compensated Cz silicon. It is believed that the BO defect density in compensated silicon depends on the B concentration and the net doping concentration. Moreover, High B concentration in the compensated silicon results in very serious cell efficiency loss. Furthermore, The electrical parameters of the reference and compensated cells can get fully recovered by illumination at high temperatures.
Moreover, the LID in n-type B-doped Cz silicon with thermal donors (TDs) compensation is also reported. The advantage of TDs compensation is able to obtain a variation of carrier density but with a constant NB. We find that the formation of B-O complex also occurs under the light illumination and can be annealed out quickly in the dark at 200 oC. The Nt* exhibits a nonlinear dependence on the majority carrier concentrations n0, and the Rgen is independent on the n0. The formation activation energy is determined to be 0.4 eV, identical to the value in p-type Si. Based on the results, we believe that the nature of LID in p- and n-type silicon should be the same.