The Path from Invention to Product: Electrodeposition II
Wednesday, 8 October 2014: 14:00-16:20
Expo Center, 1st Floor, Universal 1 (Moon Palace Resort)
Chairs:
Giovanni Zangari
and
Gery R. Stafford
14:40
Reaction Mechanism of Thiourea as Suppressor in Electroless Cu Deposition Process
M. Kunimoto (Institute for Nanoscience and Nanotechnology, Waseda University), T. Naito (Department of Applied Chemistry, Waseda University), H. Nakai (Department of Chemistry and Biochemistry, Waseda University), and T. Homma (Institute for Nanoscience and Nanotechnology, Waseda University, Department of Applied Chemistry, Waseda University)
15:20
In Situ Surface Enhanced Raman Spectroscopy Analysis of the Electrochemical Deposition Processes Using Plasmon Antenna Sensors
T. Homma (Department of Applied Chemistry, Waseda University, Institute for Nanoscience and Nanotechnology, Waseda University), T. Yamamoto, M. Nakamura (Department of Applied Chemistry, Waseda University), M. Kunimoto, M. Saito, and M. Yanagisawa (Institute for Nanoscience and Nanotechnology, Waseda University)
