General ALD Session

Monday, 6 October 2014: 10:00-12:00
Expo Center, 1st Floor, Universal 16 (Moon Palace Resort)
Chairs:
O. van der Straten and Gijs Dingemans
10:00
Atomic Layer Deposition of Nanostructured Tunable Resistance Coatings: Growth, Characterization, and Electrical Properties
A. U. Mane (Argonne National Laboratory), W. M. Tong, A. D. Brodie, M. A. McCord (KLA-Tencor), and J. W. Elam (Argonne National Laboratory)
10:40
Study of Y2O3 Thin Film Prepared by Plasma Enhanced Atomic Layer Deposition
G. Y. Cho, S. Noh (School of mechanical and aerospace engineering, Seoul national university), Y. H. Lee (Seoul National University, School of mechanical and aerospace engineering), S. Ji (Graduate School of Convergence Science and Technology (GSCST), Seoul National University), and S. W. Cha (Mechanical and Aerospace Engineering, Seoul National University)
11:00
ALD Applied to Conformal Rare-Earth Coating of ZnO Nanoparticles for Low Temperature Thermal Imaging Applications
E. Rauwel (University of Oslo, Dept. of Chemistry and SMN), A. Galeckas (University of Oslo, Dept. of Physics and SMN), P. Rauwel (University of Oslo, Dept. of Physics and SMN, University of Tartu, Dept. of Physics), P. A. Hansen, D. Wragg, O. Nilsen, and H. Fjellvåg (University of Oslo, Dept. of Chemistry and SMN)
11:20
BiFeO3 Thin Films Prepared by ALD
A. R. Akbashev (Department of Materials Science and Engineering, Drexel University, Philadelphia, Pennsylvania, USA) and J. E. Spanier (A J Drexel Institute for Energy and the Environment, Drexel University, Philadelphia, Pennsylvania, USA)
11:40
ALD Synthesis of Ternary PbSeTe Layers Alternating with the Binary PbTe in Nanolaminate Structures for High Zt Thermoelectric Materials
X. Chen (Applied Research Center at Thomas Jefferson National Accelerator Laboratories), K. Zhang (Applied Research Center at Thomas Jefferson National Accelerator Laboratories, Old Dominion University), A. D. Ramalingom Pillai (Old Dominion University), H. Baumgart (Applied Research Center at Thomas Jefferson National Accelerator Laboratories), and V. Kochergin (MicroXact Inc.)