P1 Atomic Layer Deposition Applications 10

Lead Organizer: F. Roozeboom (Eindhoven University of Technology)

Co-organizers: Stefan De Gendt (imec, Kapeldreef 75, 3001 Leuven, Belgium) , Annelies Delabie (imec) , J. W. Elam (Argonne National Laboratory) , O. van der Straten (IBM Research) and A. Londergan (Qualcomm Technologies, Inc.)

Monday, 6 October 2014

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10:00-12:00


General ALD Session
Expo Center, 1st Floor, Universal 16
Chair(s): O. van der Straten and Gijs Dingemans

14:00-17:00


ALD Reactor Design/Plasmonics I
Expo Center, 1st Floor, Universal 16
Chair(s): O. van der Straten and Anil U. Mane

Tuesday, 7 October 2014

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08:20-09:40


Molecular Layer Deposition
Expo Center, 1st Floor, Universal 16
Chair(s): F. Roozeboom and J. W. Elam

10:00-12:00


Advanced Semiconductor Applications I
Expo Center, 1st Floor, Universal 16
Chair(s): Laura Nyns, Stefan De Gendt and Robert M Wallace

14:00-15:20


Advanced Semiconductor Applications II
Expo Center, 1st Floor, Universal 16
Chair(s): Stefan DeGendt and Robert M Wallace

15:40-17:20


New ALD Materials and Processes I
Expo Center, 1st Floor, Universal 16
Chair(s): J. W. Elam and Christian Dussarrat

18:00-20:00


P1 Poster Session
Expo Center, 1st Floor, Center and Right Foyers

Wednesday, 8 October 2014

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08:00-09:40


New ALD Materials and Processes II
Expo Center, 1st Floor, Universal 16
Chair(s): O. van der Straten and Thomas Henke

10:00-11:40


Energy Applications I
Expo Center, 1st Floor, Universal 16
Chair(s): F. Roozeboom and Andrew G. Scheuermann

14:00-15:20


Energy Applications II
Expo Center, 1st Floor, Universal 16
Chair(s): O. van der Straten and Parag Banerjee

15:20-16:10


Plasmonics II/Closing Remarks
Expo Center, 1st Floor, Universal 16
Chair(s): J. W. Elam and F. Roozeboom