Energy Applications I

Wednesday, 8 October 2014: 10:00-11:40
Expo Center, 1st Floor, Universal 16 (Moon Palace Resort)
Chairs:
F. Roozeboom and Andrew G. Scheuermann
10:00
1627
Doping Mechanism in Transparent Conductive ZnO Films Grown by Atomic Layer Deposition
D. J. Lee (Brown University), J. Y. Kwon (Yonsei University), S. H. Kim (Yeungnam University), H. M. Kim (Seoul Nationl University), J. Xu (Brown University), and K. B. Kim (Seoul National University)
 
1628
Tuning Photoresponse of Ultrathin ZnO Films Using Few Angstrom Al2O3 Overlayers (Cancelled)
11:00
1629
Selective-Area Atomic Layer Deposition of Copper Nanostructures for Direct Electro-Optical Solar Energy Conversion
B. G. Willis, J. Qi, X. Jiang (University of Connecticut), J. Chen, G. J. Weisel, and D. T. Zimmerman (The Pennsylvania State University)
See more of: P1: Atomic Layer Deposition Applications 10
See more of: Electronic Materials and Processing
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