New ALD Materials and Processes I

Tuesday, 7 October 2014: 15:40-17:20
Expo Center, 1st Floor, Universal 16 (Moon Palace Resort)
J. W. Elam and Christian Dussarrat
Manganese Precursor Selection and the Thermal Atomic Layer Deposition of Copper/Manganese Alloy Films
L. C. Kalutarage (Wayne State University), S. B. Clendenning (Intel Corporation), and C. H. Winter (Wayne State University)
Promoted Platinum Catalytic Activity and Thermal Stability with Nano-Scale Cobalt Oxide Coating via Atomic Layer Deposition
K. Cao, B. Huang, Y. Zhang, X. Liu, B. Shan, and R. Chen (Huazhong University of Science and Technology)
Flash-Lamp-Enhanced Atomic Layer Deposition of Thin Films
T. Henke, M. Knaut, C. Hossbach, M. Geidel (Technische Universitšt Dresden), L. Rebohle (Helmholtz Zentrum), M. Albert (Technische Universitšt Dresden), W. Skorupa (Helmholtz Zentrum), and J. W. Bartha (Technische Universitšt Dresden)