Molecular Layer Deposition

Tuesday, 7 October 2014: 08:20-09:40
Expo Center, 1st Floor, Universal 16 (Moon Palace Resort)
Chairs:
F. Roozeboom and J. W. Elam
08:20
1606
Molecular Layer Deposition of Nanoscale Organic Films for Nanoelectronics Applications
D. Bergsman, H. Zhou, and S. F. Bent (Stanford University)
09:00
1607
Highly Luminescent Monolayers Prepared by Molecular Layer Deposition
A. Räupke (University of Wuppertal, Germany), F. Albrecht (Technical University of Braunschweig, Germany), J. Maibach (Technische Universität Darmstadt, InnovationLab GmbH, Heidelberg, Germany), A. Behrendt, A. Polywka, R. Heiderhoff (University of Wuppertal, Germany), J. Helzel, T. Rabe, H. H. Johannes (Technical University of Braunschweig, Germany), W. Kowalsky (Technical University of Braunschweig, Germany, InnovationLab GmbH, Heidelberg, Germany), E. Mankel, T. Mayer (Technische Universität Darmstadt, InnovationLab GmbH, Heidelberg, Germany), P. Görrn, and T. Riedl (University of Wuppertal, Germany)
See more of: P1: Atomic Layer Deposition Applications 10
See more of: Electronic Materials and Processing
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