New ALD Materials and Processes II

Wednesday, 8 October 2014: 08:00-09:40
Expo Center, 1st Floor, Universal 16 (Moon Palace Resort)
Chairs:
O. van der Straten and Thomas Henke
08:00
1624
Heteroleptic Precursors for Atomic Layer Deposition
J. Niinistö, T. Blanquart, S. Seppälä, M. Ritala, and M. Leskelä (University of Helsinki)
08:40
1625
Design, Synthesis and ALD Assessment of Organometallic Precursors for Semiconductor Applications
C. Dussarrat (Air Liquide Laboratories)
09:20
1626
Thin-film Deposition of Silicon Nitrides and Oxides from Trihydridosilanes
B. Arkles, Y. Pan (Gelest Inc.), and A. Kaloyeros (College of Nanoscale Science and Engineering, The University at Albany-SUNY)
See more of: P1: Atomic Layer Deposition Applications 10
See more of: Electronic Materials and Processing
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