New ALD Materials and Processes II

Wednesday, 8 October 2014: 08:00-09:40
Expo Center, 1st Floor, Universal 16 (Moon Palace Resort)
O. van der Straten and Thomas Henke
Heteroleptic Precursors for Atomic Layer Deposition
J. Niinistö, T. Blanquart, S. Seppälä, M. Ritala, and M. Leskelä (University of Helsinki)
Thin-film Deposition of Silicon Nitrides and Oxides from Trihydridosilanes
B. Arkles, Y. Pan (Gelest Inc.), and A. Kaloyeros (College of Nanoscale Science and Engineering, The University at Albany-SUNY)