ALD Reactor Design/Plasmonics I

Monday, 6 October 2014: 14:00-17:00
Expo Center, 1st Floor, Universal 16 (Moon Palace Resort)
Chairs:
O. van der Straten and Anil U. Mane
14:00
1602
Merits of Batch ALD
G. Dingemans, B. Jongbloed, W. Knaepen, D. Pierreux, L. Jdira, and H. Terhorst (ASM)
14:40
1603
Plasma Enhanced Atomic Layer Deposition on Powders
G. Rampelberg, D. Longrie, D. Deduytsche, and C. Detavernier (Ghent University)
15:20
1604
Multiscale Simulations of ALD in Cross Flow Reactors
A. Yanguas-Gil, J. A. Libera, and J. W. Elam (Argonne National Laboratory)
15:40
1605
Design Considerations for ZnO Transistors Made Using Spatial ALD
S. F. Nelson, C. R. Ellinger, and L. W. Tutt (Eastman Kodak Company)
16:20
1633
Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
S. M. Prokes (Naval Research Lab) and O. J. Glembocki (U.S. Naval Research Laboratory)
See more of: P1: Atomic Layer Deposition Applications 10
See more of: Electronic Materials and Processing
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