ALD Reactor Design/Plasmonics I

Monday, 6 October 2014: 14:00-17:00
Expo Center, 1st Floor, Universal 16 (Moon Palace Resort)
O. van der Straten and Anil U. Mane
Merits of Batch ALD
G. Dingemans, B. Jongbloed, W. Knaepen, D. Pierreux, L. Jdira, and H. Terhorst (ASM)
Plasma Enhanced Atomic Layer Deposition on Powders
G. Rampelberg, D. Longrie, D. Deduytsche, and C. Detavernier (Ghent University)
Multiscale Simulations of ALD in Cross Flow Reactors
A. Yanguas-Gil, J. A. Libera, and J. W. Elam (Argonne National Laboratory)
Design Considerations for ZnO Transistors Made Using Spatial ALD
S. F. Nelson, C. R. Ellinger, and L. W. Tutt (Eastman Kodak Company)
Self Assembled Metamaterials Formed via Plasma Enhanced ALD of Ag Thin Films
S. M. Prokes (Naval Research Lab) and O. J. Glembocki (U.S. Naval Research Laboratory)