Energy Applications II

Wednesday, 8 October 2014: 14:00-15:20
Expo Center, 1st Floor, Universal 16 (Moon Palace Resort)
Chairs:
O. van der Straten and Parag Banerjee
14:00
1630
Enhanced Visible-Light Photoelectrochemical Performance of Titana Nanotubes Modified by Atomic Layer Deposited Cobalt Oxide
B. Huang (Huazhong University of Science and Technology), Y. Wen (State Key Laboratory of Material Processing and Die &Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, Hubei, People’s Republic of China), B. Shan, and R. Chen (Huazhong University of Science and Technology)
14:20
1631
Electrical Properties of High Mobility Ultrathin Amorphous Indium Zinc Oxide Deposited by Atomic Layer Deposition
Y. H. Cho (Seoul National University), D. J. Lee (Brown University), S. Y. Cho (Seoul National University), H. M. Kim (Seoul Nationl University), and K. B. Kim (Seoul National University)
14:40
1632
The Effect of SPA-SiO2 Tunnel Oxide Thickness for Metal-Insulator-Silicon Photoelectrochemical Cells
A. G. Scheuermann, D. Q. Lu (Stanford University), T. Ito (Stanford University, Tokyo Electron Ltd.), C. E. D. Chidsey, and P. C. McIntyre (Stanford University)
See more of: P1: Atomic Layer Deposition Applications 10
See more of: Electronic Materials and Processing
<< Previous Session | Next Session >>