P1 Poster Session

Tuesday, 7 October 2014: 18:00-20:00
Expo Center, 1st Floor, Center and Right Foyers (Moon Palace Resort)
RF Power Effect of Post-Deposition Oxygen Plasma Treatment on HfO2 Gate Dielectrics
T. C. Bo (Department of Electrical Engineering, National Chi-Nan University) and Y. L. Cheng (National Chi-Nan University)
Precursor Development and Application for Atomic Layer Deposition
T. M. Chung (Korea Research Institute of Chemical Technology)
Development of Continuous and Ultrathin Pt Electrocatalysts Using Plasma-Assisted ALD
J. W. Clancey, A. S. Cavanagh (University of Colorado), R. Kukreja, A. Kongkanand (General Motors), and S. M. George (University of Colorado)
Growth of Al Doped ZnO Thin Films by Atomic Layer Deposition Process
K. Zhang, X. Chen (Applied Research Center at Thomas Jefferson National Accelerator Laboratories), P. Lin (Old Dominion University), S. K. R. Obulreddy (Old Dominion University, Applied Research Center), and H. Baumgart (Applied Research Center at Thomas Jefferson National Accelerator Laboratories)
Mechanical/Structural Properties of ALD Zirconium Oxide (ZrO2) Thin Films for High-Tech Applications
M. A. Mamun (Old Dominion University), H. Baumgart (Applied Research Center at Thomas Jefferson National Accelerator Laboratories), and A. A. Elmustafa (Old Dominion University)
Nanomechanical Properties of Titanium Oxide (TiO2) Grown by Atomic Layer Deposition
M. A. Mamun (Old Dominion University), H. Baumgart (Applied Research Center at Thomas Jefferson National Accelerator Laboratories), and A. A. Elmustafa (Old Dominion University)
Nanomechanical Properties of Tungsten Trioxide (WO3) Grown by Atomic Layer Deposition
M. A. Mamun (Old Dominion University), K. Zhang, H. Baumgart (Applied Research Center at Thomas Jefferson National Accelerator Laboratories), and A. A. Elmustafa (Old Dominion University)