P1 Poster Session

Tuesday, 7 October 2014: 18:00-20:00
Expo Center, 1st Floor, Center and Right Foyers (Moon Palace Resort)
1617
RF Power Effect of Post-Deposition Oxygen Plasma Treatment on HfO2 Gate Dielectrics
T. C. Bo (Department of Electrical Engineering, National Chi-Nan University) and Y. L. Cheng (National Chi-Nan University)
1618
Precursor Development and Application for Atomic Layer Deposition
T. M. Chung (Korea Research Institute of Chemical Technology)
1619
Development of Continuous and Ultrathin Pt Electrocatalysts Using Plasma-Assisted ALD
J. W. Clancey, A. S. Cavanagh (University of Colorado), R. Kukreja, A. Kongkanand (General Motors), and S. M. George (University of Colorado)
1620
Growth of Al Doped ZnO Thin Films by Atomic Layer Deposition Process
K. Zhang, X. Chen (Applied Research Center at Thomas Jefferson National Accelerator Laboratories), P. Lin (Old Dominion University), S. K. R. Obulreddy (Old Dominion University, Applied Research Center), and H. Baumgart (Applied Research Center at Thomas Jefferson National Accelerator Laboratories)
1621
Mechanical/Structural Properties of ALD Zirconium Oxide (ZrO2) Thin Films for High-Tech Applications
M. A. Mamun (Old Dominion University), H. Baumgart (Applied Research Center at Thomas Jefferson National Accelerator Laboratories), and A. A. Elmustafa (Old Dominion University)
1622
Nanomechanical Properties of Titanium Oxide (TiO2) Grown by Atomic Layer Deposition
M. A. Mamun (Old Dominion University), H. Baumgart (Applied Research Center at Thomas Jefferson National Accelerator Laboratories), and A. A. Elmustafa (Old Dominion University)
1623
Nanomechanical Properties of Tungsten Trioxide (WO3) Grown by Atomic Layer Deposition
M. A. Mamun (Old Dominion University), K. Zhang, H. Baumgart (Applied Research Center at Thomas Jefferson National Accelerator Laboratories), and A. A. Elmustafa (Old Dominion University)
See more of: P1: Atomic Layer Deposition Applications 10
See more of: Electronic Materials and Processing
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