Nanomechanical Properties of Titanium Oxide (TiO2) Grown by Atomic Layer Deposition
TiO2 films of 200, 300, and 500, ALD cycles were deposited on p-type Si (100) substrates using Atomic layer deposition (ALD) technology. These films have been tested for structural, surface morphology, and nanomechanical properties using nanoindentation. The structural and surface properties will be explored using X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM). We will discuss the influence of the deposition technique on the structure and properties of the films citing the superiority of the ALD technique that is particularly used in the fabrication of the films that are presented in this study. A field emission scanning electron microscopy (FE-SEM) image is shown in Figure 1.
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