Semiconductor Electrochemistry - Electrodeposition and Growth

Wednesday, 27 May 2015: 15:20-17:40
Conference Room 4F (Hilton Chicago)
Andrew Campion Hillier
(Invited) Investigations into the Formation of Germanene Using Electrochemical Atomic Layer Deposition (E-ALD)
M. Ledina, X. Liang (The University of Georgia), Y. G. Kim (California Institute of Technology, JCAP), J. Jung, B. Perdue, C. Tsang (The University of Georgia), M. Soriaga (California Institute of Technology, JCAP), and J. L. Stickney (The University of Georgia)
ZnO Electrodeposition on Boron-Doped Diamond: Effects of Zinc Precursor Concentration
P. Gautier, A. Vallée (ILV- CNRS - UVSQ), A. Etcheberry (Institut Lavoisier de Versailles, UVSQ), and N. Simon (ILV- CNRS - UVSQ)
Investigation of Photoelectrochemical Deposition of Zn(S,O) Via Nitrate Ions Reduction in the Presence of Thiourea
S. Gallanti, E. Chassaing (IRDEP), M. Bouttemy (Institut Lavoisier de Versailles), A. Etcheberry (CNRS-UVSQ), D. Lincot, and N. Naghavi (IRDEP)