Here we reveal the relationship between the atomic migration and thermal conductivity of Al/Cu interface in nanoscale heat transfer by using non-equilibrium molecular dynamics method.
To create the Al/Cu interface, the modified Embedded-atom method (EAM) for alloy is used to describe the interatomic interactions between Cu/Cu, and Al/Cu interface.
The results show that the interfacial diffusion is enhanced with the increase of the temperature from 400K-600K. The thermal conductivity of the Al/Cu interface, first increases, and then decreases. When the temperature is over 600K, it reaches the recrystallization temperature of Al. which makes to Al atoms recrystallization. The recrystallization of Al atoms may reduce the heat transfer efficiency of the Al/Cu diffusion region. That is to say, it reduces the thermal conductivity of Al/Cu interface when the temperature is over 600K. This means that we can enhance the interfacial heat transfer efficiency of Al/Cu interface and the cooling efficiency of IC by heat treatment in advance on interface structures. This investigation is helpful for understanding the interfacial heat transfer mechanism of the interface structures in the IC, which is helpful for the design of the interface in micro/nano manufacturing and benefit for the estimate the reliability of the IC manufacturing.