The WO3 thin films were deposited on unheated fused silica glass substrates by dc magnetron reactive sputtering using a W metal target, and with Ar and O2 as the sputtering and reactive gases, respectively. Post-annealing temperature was varied from 300 to 800 oC for the films sputter deposited at total gas pressure of 5.0 Pa. Furthermore, total gas pressure during the deposition was varied from 1.0 to 9.0 Pa. After the post-annealing at 400 or 600 oC, Pt nanoparticles were deposited on the WO3 film surface also by sputtering for 0, 7 or 40 sec. The surface coverage of Pt on the WO3 films were estimated by X-ray photoelectron spectroscopy. The Photocatalytic decomposition of acetaldehyde (CH3CHO) on the Pt/WO3 films was evaluated by the decrease in the concentration in the quartz cell. The visible light source was a Xe lamp with a 410-500 nm band pass filter (1.0 mW/cm2 at the film surface).
Figure shows the photocatalytic decomposition for the WO3 films loaded by the Pt nanoparticles under visible light irradiation. It was found that the potocatalytic activities of the films crystallized by post-annealing（400 oC）was superior to the films deposited on the heating substrate at 800 oC, which was enhanced by the Pt loadings.
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