Materials Processing 2

Hess, Dennis

Monday, 14 May 2018: 14:00-17:30

Room 306 (Washington State Convention Center)

Chairs:

Dennis W. Hess , Uros Cvelbar and Sreeram Vaddiraju

14:00

1181

(Invited) Beyond the Highs and Lows: A Selectively Colorful Yet Chilly Perspective on the Future of Dielectrics in Nanoelectronic Devices

S. W. King (Intel Corporation)

14:40

1182

Effect of Cu, Ni Seeds on the Formation of Uniform Ag Layer on PET Film Via Atmospheric Pressure Plasma Reduction

H. J. Oh, V. D. Dao, and H. S. Choi (Chungnam National University)

15:00

1183

UV Assisted Densification of Perhydropolysilazane (PHPS) Based Spin-on Glass in High Aspect Ratio Gap Fill Structure

S. Mehta (IBM Research, IBM assignee @ Global Foundries, Inc.), H. Sheng (Global Foundries, Inc.), R. Krishnan (GLOBALFOUNDRIES Inc.), B. Haran (IBM Research), T. Han, M. Berardi, Z. Bayndir, B. Yatzor, J. Liu (Global Foundries, Inc.), J. Shepard (Global Foundries), and S. Grunow (GLOBALFOUNDRIES Inc)

15:20

1184

Effect of Cathodic Current on the Microstructure and Characteristics of Micro-Arc Oxidation Ceramic Coatings on 7075 Aluminum Alloy

T. Y. Wang and H. C. Lin (Department of Materials Science and Engineering, NTU)

15:40

1185

Reaction Mechanisms of Halogenated Silanes on N-Rich Surfaces during Atomic Layer Deposition of Silicon Nitride

G. P. Hartmann (University of Texas at Austin), P. Ventzek (Tokyo Electron America Inc.), T. Iwao, K. Ishibashi (Tokyo Electron Technology Solutions Ltd.), and G. S. Hwang (University of Texas at Austin)

16:00

Break

16:10

1186

Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD Dielectrics and Ta-Based Amorphous Metals

M. A. Jenkins, T. Klarr, J. M. McGlone, J. F. Wager, and J. F. Conley Jr. (Oregon State University)

16:30

1187

Characterization of Low-Temperature Atomic Layer Deposited Cobalt Oxide

K. E. K. Holden, M. A. Jenkins, and J. F. Conley Jr. (Oregon State University)

16:50

1188