G01 - Particle Removal

Tuesday, 15 October 2019: 14:00-16:00
Room 209 (The Hilton Atlanta)
Chairs:
Jin-Goo Park and Toshiyuki Sanada
14:00
The Effect of Surface States and Chemistry on Ceria Particles during STI Post-CMP Cleaning
N. P. Yerriboina, S. Sahir, S. Y. Han, K. M. Han, and J. G. Park (Hanyang University)
14:20
Development of “Soft” Cleaning Chemistries for Enhanced STI Post-CMP Cleaning
J. J. Keleher, C. F. Graverson, and K. M. Wortman-Otto (Lewis University, Department of Chemistry)
14:40
Skin Layer Effects on Adhesion Forces of PVA Brushes and Its Temperature Dependence
K. Yamada, T. Sanada, Y. Mizushima (Shizuoka University), A. Fukunaga, and H. Hiyama (Ebara Corporation)
15:00
Contact Area Distribution during PVA Brushes Scrubbing
T. Miyaki, T. Sanada, Y. Mizushima (Shizuoka University), A. Fukunaga, and H. Hiyama (Ebara Corporation)
15:20
Analysis of Polyethylene Latex Particle Removal Mechanism on SiO2 Wafer Using Ultrasonic Spray Cleaning
Y. Seike, R. Sawaki, R. Shimizu (Aichi Institute of Technology), H. Tomomi, Y. Honda, M. Sato (Honda Electronics Co., LTD.), and T. Mori (Aichi Institute of Technology)
15:40
Evolutional Wet Cleaning in the Extreme Ultraviolet Era
B. Choi (EW tech), K. Ryoo (Soonchunhyang University), Y. Jung, I. Choi, H. Kim, and J. Lee (EW tech)
See more of: G01: 16th International Symposium on Semiconductor Cleaning Science and Technology (SCST 16)
See more of: Electronic Materials and Processing
<< Previous Session | Next Session >>