Tuesday, 15 October 2019: 16:40-18:00
Room 309 (The Hilton Atlanta)
Chairs:
Nikolay Dimitrov
and
Natasa Vasiljevic
16:40
Electrochemical Atomic Layer Deposition: Self-Terminated Electrodeposition Reactions
Y. Liu (Argonne National Laboratory), D. Gokcen, S. H. Ahn (National Institute of Standards and Technology), N. L. Ritzert (NIST), R. Wang (National Institute of Standards and Technology), E. Gillette (NIST), S. Ambrozik (National Institute of Standards and Technology, NIST), C. Hangarter (NIST), N. Dimitrov (Binghamton University), H. You (Argonne National Laboratory), U. Bertocci, and T. P. Moffat (National Institute of Standards and Technology)