G01 - BEOL Cleaning

Ruzyllo, Jerzy

Tuesday, 15 October 2019: 17:00-17:40

Room 209 (The Hilton Atlanta)

Chair:

Jerzy Ruzyllo

17:00

Wet Metal Recess Process for Enabling Scaling Boosters

Y. Akanishi (SCREEN Semiconductor Solutions Co., Ltd.), E. Kesters, Q. T. Le, A. Pacco, and F. Holsteyns (imec)

17:20

Comprehensive Study on Vapor-Phase Surface Cleaning of Cu Films Using Anhydrous N₂H₄

S. M. Hwang, A. L. N. Kondusamy, Z. Qin, H. S. Kim, Y. C. Jung, L. F. Peña, K. Tan, J. F. Veyan (The University of Texas at Dallas), D. Alvarez Jr. (RASIRC), J. Spiegelman (Rasirc), and J. Kim (The University of Texas at Dallas)

See more of: G01: 16th International Symposium on Semiconductor Cleaning Science and Technology (SCST 16)
See more of: Electronic Materials and Processing

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