G02 - Solar Energy Conversion: Photovoltaics and Photoelectrochemistry

Tuesday, 15 October 2019: 15:00-17:20
Room 214 (The Hilton Atlanta)
Chairs:
Jolien Dendooven and Rong Chen
15:00
(Invited) Atomic Layer Deposition for Stabilizing Surface-Bound Molecules for Photoelectrochemistry and Catalysis
M. D. Losego (Georgia Institute of Technology)
15:40
Break
16:00
Application of Atomic Layer Deposition for Fabrication of Solar Cells
K. Frohlich (Institute of Electrical Engineering, SAS, Centre for Advanced Materials Application (CEMEA) SAS), M. Mikolášek (Institute of Electronics and Photonics, STU Bratislava), R. Subair, V. Nadazdy (Institute of Physics, SAS), A. Rosová, M. Precner (Institute of Electrical Engineering, SAS), N. Tasaltin (Maltepe University), E. Alturk, E. Tekin (TUBITAK MAM), E. Aslan (Sakarya University), T. Ates Turkmen (Yildiz Technical University), and E. Majková (Institute of Physics, SAS, Centre for Advanced Materials Application (CEMEA), SAS)
16:20
Development and Characterization of Copper-Doped Nickel Oxide Deposited By Atomic Layer Deposition
A. H. Berg, N. K. Noel, S. Wagner, B. P. Rand, and J. Sturm (Princeton University)
16:40
(Invited) Application of ALD-Grown Metal Oxide Layers for Energy Applications: Photovoltaic and Photoelectrochemical Water Splitting
B. Shin (KAIST)
See more of: G02: Atomic Layer Deposition Applications 15
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