G02 - Nano and Flexible Electronics II

van der Straten, Oscar

Monday, 14 October 2019: 14:00-14:20

Room 214 (The Hilton Atlanta)

Chairs:

Oscar van der Straten and Christophe Vallée

14:00

Change of Electrical Properties of Rutile- and Anatase-TiO₂ Films By Atomic Layer Deposited Al₂O₃

T. Nabatame (WPI-MANA, National Institute for Materials Science), I. Yamamoto (WPI-MANA, National Institute for Materials Science, Shibaura Institute of Technology), T. Sawada, A. Ohi, T. D. Dao (WPI-MANA, National Institute for Materials Science), T. Ohishi (Shibaura Institute of Technology), and T. Nagao (WPI-MANA, National Institute for Materials Science)

See more of: G02: Atomic Layer Deposition Applications 15
See more of: Electronic Materials and Processing

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