G02 - Area Selective Deposition and Atomic Layer Etching II

Tuesday, 15 October 2019: 14:00-15:00
Room 214 (The Hilton Atlanta)
Chairs:
Chanyuan Liu and Byungha Shin
14:00
Electrochemical Atomic Layer Etching (e-ALE) of Copper
Y. Gong, K. Venkatraman, and R. Akolkar (Case Western Reserve University)
14:20
(Invited) Selective Atomic Layer Deposition Strategies for Catalytic Applications
R. Chen, K. Cao, X. Liu, J. Cai, B. Shan, and Y. Wen (Huazhong University of Science and Technology)
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