G01 - BEOL

Monday, 30 May 2022: 10:20-11:20
West Meeting Room 113 (Vancouver Convention Center)
Chairs:
Sangwoo Lim and Quoc-Toan Le
10:20
1245
Reclaim Mode Post Etch Residue Remover Solutions for Advanced Technology Nodes
R. Gupta (BASF Corporation) and A. Klipp (BASF SE)
10:40
1246
Wet Cleaning of Molybdenum for Nano Interconnects
Q. T. Le (IMEC), H. Guevenc, A. Ibrahim, A. Klipp (BASF SE), S. Decoster, G. Murdoch, and E. A. Sanchez (IMEC)
11:00
1247
The Photocatalytic Activities of Zinc-Tin-Oxide Nanowires with Modification of Ag Nanoparticles
T. L. Hsieh, J. C. Su, and K. C. Lu (National Cheng Kung University)
See more of: G01: 17th International Symposium on Semiconductor Cleaning Science and Technology (SCST 17)
See more of: Electronic Materials and Processing
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