UiO-66 (UiO stands for the University of Olso) film membrane is promising for molecular/ion separations owing to its sub-nano-sized pore apertures and superior chemical stability among the metal-organic framework (MOF) family, but the preparation of it remains difficult and challenging up to now. Here we report a fast and one-pot reductive deposition approach to the high-quality UiO-66 film coatings. In the deposition, the nitrate anions are introduced as pro-bases to accelerate the deprotonation of the ditopic linker-H₂BDC (1,4-benzenedicarboxylic acid), which renders the continuous UiO-66 films coating in an hour. Importantly, the morphology of the deposited UiO-66 films can be well-tuned by the molar ratio of the ditopic linker to monotopic modulator because of their completing deprotonation process. The continuous, intergrown, and crystalline UiO-66 films can be obtained at optimized conditions (i.e., deposition temperature at 120 ℃, and the molar ratio of the linker to the modulator of 1:120). Besides, the proposed reductive deposition is also feasible for the fabrication of the analogues of UiO-66 with distinct ligands, like the Zr-fumaric films and Zr-naph (naph is the 1,4-naphthalenedicarboxylic acid) films. These deposited films can be prospective separation mediums for molecular sieving.