Electrodeposition of metals with controlled crystallography and grain structure is critical for applications including batteries, electronic circuit fabrication, and industrial coating processes. For metal-anode-based batteries in particular, it is important to understand how the electrode surface affects the crystallography of electrodeposited metals. Graphene and other 2D materials have recently been shown to exhibit strong effects on metal crystallography during electrodeposition, but it is unclear the extent to which graphene is affecting epitaxy, and further understanding of the 3D metal/2D material interface is crucial for advancing interfacial electrodeposition control. In this work, we study the influence of graphene and the underlying Cu substrate on the crystal structure and morphology of electrodeposited metals. Based on extensive electrochemical testing and electron backscatter diffraction (EBSD), we find that the orientation of the substrate underneath graphene (usually copper) exerts a controlling crystallographic influence on the electrodeposited metal overlayer, rather than the graphene layer itself. Further transmission electron microscopy (TEM) and Raman spectroscopy investigations are used to probe the nature of the interface and the graphene layer. These findings are important because they show that graphene can potentially be used as an interlayer to enable high-quality remote epitaxy between a variety of metals that normally exhibit inhibited epitaxy because of surface oxide layers.