G02 - Fundamentals of ALD

Monday, 10 October 2022: 14:00-16:00
Room 211 (The Hilton Atlanta)
Chairs:
Fred Roozeboom and Andrea Illiberi
14:00
Characterization of the Local Atomic Structure of ALD Coated Interfaces
M. J. Young, N. C. Paranamana, R. C. Gettler, H. D. Koenig, and X. He (University of Missouri-Columbia)
14:40
Chemical Stability of Atomic Layer Deposited (ALD) Alumina Thin Films in Aqueous Solutions
S. Fairach, S. Willis, and M. D. Losego (Georgia Institute of Technology)
15:00
(Invited) Investigating Surface Reaction Thermodynamics: In Situ Calorimetry for Atomic Layer Deposition
A. R. Bielinski and A. B. F. Martinson (Argonne National Laboratory)
15:40
Vapor Phase Infiltration of Conjugated Polymers Using TiCl4 and VOCl3 and Their Resulting Optical and Electrical Properties
L. Zhang, S. Gregory, K. Malinowski, A. Savaresse, and M. D. Losego (Georgia Institute of Technology)
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