G02 Atomic Layer Deposition and Etching Applications 18

Lead Organizer: Fred Roozeboom (TNO-Holst Centre, Eindhoven)

Co-organizers: Stefan De Gendt (KU Leuven, imec) , Jolien Dendooven (Department of Solid State Sciences, Ghent University) , Jeffrey W. Elam (Argonne National Laboratory) , Oscar van der Straten (IBM Corporation Research Center) , Andrea Illiberi (ASM Europe) , Ganesh Sundaram (Veeco-CNT) , Rong Chen (Huazhong University of Science and Technology) , Oana Leonte (Berkeley Polymer Technologies, Inc.) , Thorsten Lill (Lam Research Corporation) and Matthias J. Young (University of Missouri-Columbia)

Sunday, 9 October 2022

13:55-15:20


G02 - Tutorial
Room 211
Chair(s): Andrea Illiberi and Jeffrey W. Elam

Monday, 10 October 2022

08:15-12:00


G02 - Nanoelectronics 1
Room 211
Chair(s): Oscar van der Straten, Fred Roozeboom, Jolien Dendooven and Stefan De Gendt

14:00-16:00


G02 - Fundamentals of ALD
Room 211
Chair(s): Fred Roozeboom and Andrea Illiberi

18:00-20:00

Tuesday, 11 October 2022

08:20-11:40


G02 - Nanoelectronics 2
Room 211
Chair(s): Jolien Dendooven and Stefan De Gendt

14:00-17:20


G02 - ALD for Lithium Ion Batteries
Room 211
Chair(s): Matthias J. Young and Jeffrey W. Elam

Wednesday, 12 October 2022

08:20-10:00


G02 - Molecular and Hybrid Layer Processing 1
Room 211
Chair(s): Oana Leonte and Oscar van der Straten

10:20-12:00


G02 - ALD Present and Future
Room 211
Chair(s): Thorsten Lill and Ganesh Sundaram

14:00-16:00


G02 - ALD for Catalysis
Room 211
Chair(s): Ganesh Sundaram and Oana Leonte

Thursday, 13 October 2022

09:00-10:40


G02 - Molecular and Hybrid Layer Processing 2
Room 211
Chair(s): Fred Roozeboom and Jolien Dendooven

11:00-12:00


G02 - ALD for Membrane Applications
Room 211
Chair(s): Rong Chen and Jolien Dendooven