G02 - ALD Present and Future

Lill, Thorsten

Wednesday, 12 October 2022: 10:20-12:00

Room 211 (The Hilton Atlanta)

Chairs:

Thorsten Lill and Ganesh Sundaram

10:20

(Invited) ALD of FeSe₂, CoSe₂, and NiSe₂

X. Wang (Peking University Shenzhen Graduate School)

11:00

Solution ALD: A Versatility Process for the Growth of Sulfides and Selenides

M. K. S. Barr (Friedrich-Alexander Universität Erlangen-Nürnberg-CTFM), B. Zhao, P. Von Grundherr, V. Koch (Friedrich-Alexander Universität Erlangen-Nürnberg, Germany), J. Charvot (University of Pardubice), M. Halik (Friedrich-Alexander Universität Erlangen-Nürnberg-OMD, Germany), F. Bures (University of Pardubice), and J. Bachmann (Friedrich-Alexander Universität Erlangen-Nürnberg, Germany)

11:20

Crystallization Kinetics in Atomic Layer Deposited (ALD) Thin Films: Opportunities of Time and Chemical Environment

M. D. Losego and J. Wooding (Georgia Institute of Technology)

See more of: G02: Atomic Layer Deposition and Etching Applications 18
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