WO3 film was prepared on ITO coated glass at room temperature by RF magnetron sputtering method in an Ar-O2 atmosphere. The total pressure and the oxygen content of the atmosphere were 4.0 Pa and 13%, respectively. The thickness of WO3 film was 0.7-1.4 μm. Hydrogen intercalations into WO3 film on ITO coated glass were performed in an 0.5 M H2SO4 electrolyte with a Pt counter electrode and a calomel reference electrode. The structure of the films was determined by x-ray diffraction analysis. The thermal diffusivity of the films was measured by an ac calorimetric method and the thermal conductivity was calculated by the differential method using measured thermal diffusivity. The electrical conductivity was measured by a four-point probe method.
X-ray diffraction measurements showed that the WO3 films were amorphous. The value of thermal conductivity decreased with increasing hydrogen content x in HxWO3, from x = 0 to x = 0.33, and the value of thermal conductivity increased markedly with increasing x above x = 0.33. The hydrogen content of x = 0.33 is close to that of MIT. On the other hand, the electrical conductivity after MIT was 1×105 times higher than that before MIT. However, a variation of the electron thermal conductivity given from the electrical conductivity by the Wiedemann-Franz law is much smaller than a variation of the thermal conductivity. Therefore, the lattice thermal conductivity is expected to contribute to a change in the thermal conductivity. Present results indicate that the thermal conductivity of WO3 film can be controlled by hydrogen intercalations and potentialize the hydrogen-induced active control of thermal switches.