The MoS2 thin films were deposited at room temperature (RT) and 400°C using an Argon atmosphere with a pressure of 5.9 mTorr, and RF power of 150W. Following deposition the samples were annealed at 550°C for three hours. A visual representation of the thin film MoS2 on quartz substrate after the annealing process is seen in Figure 1. Visually the MoS2 films have a gold brown color, where the sample deposited at room temperature is slightly darker. The absorbance spectra (250-850 nm) show that the film deposited at room temperature display no peaks associated with MoS2, while the thin film deposited at 400°C show a small 'C' transition peak at ~418 nm (Figure 2). Post annealing absorbance spectra of both films indicate the four transition peaks characteristic of MoS2. The 'A' and 'B' peaks are direct transitions related to the band-edge excitons, whereas the 'C' and 'D' absorbance peaks arise from van Hove singularities in the electronic density of states associated with layered MoS2 [4,5]. X-ray diffraction (XRD) was performed using a Si substrate and the existence of the (002) plane indicates that the thin films are crystalline (Figure 3).
In conclusion, we have determined the effect of substrate temperature during deposition and post annealing on the properties of the MoS2 thin films. Additionally, preparation of crystalline MoS2 has been demonstrated using a large-scale thin film production technique. The morphology, optical – and electrical properties have been studied on ITO glass and quartz substrates.
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