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Seebeck Coefficient Measurements of Pristine and Tcnq Loaded HKUST-1 Thin Films

Tuesday, 2 October 2018
Universal Ballroom (Expo Center)
Z. M. Hassan (Karlsruhe Institute of Technology (KIT)), X. Chen (Applied Research Center), K. Zhang (Old Dominion University), E. Redel (IFG (Institute of Functional lnterfaces)), and H. Baumgart (Old Dominion University, ECE Department)
Seebeck meaurements have been performed on i) quasi-liquid epitaxially highly oriented HKUST-1 Surface Anchored Metal-Organic Framework (SURMOF) films and for comparison on ii) random polycrystalline HKUST-1 thin films; pristine as well as loaded with tetracyanoquinodimethane (TCNQ).

However, the horizontal Seebeck coefficient of highly oriented (001) SURMOF films is practically around 0 µV/K as there is no measurable horizontal carrier transport parallel to the SURMOF surface. Only in the polycrystalline and pristine HKUST-1 thin films exhibit a high and positive Seebeck coefficient of 422.30 µV/K at 330 K. For the TCNQ loaded polycrystalline HKUST-1 thin films a lowering of the Seebeck coefficient of 388.80 µV/K at 330 K.

The high Seebeck coefficients of these random polycrystalline MOF films demonstrates promising application potential of MOF films in future thermoelectric and electronic devices working highly efficient in the RT (Room Temperature) region.

  • X. Chen, Z. Wang, Z. M. Hassan, P. Lin, K. Zhang, H. Baumgart, E. Redel ECS Journal of Solid State Science and Technology 2017 6(4), 1-4.