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Investigation of the Nanomechanical Properties of Titanium Oxide Films Synthesized Using Atomic Layer Deposition

Monday, 1 October 2018
Universal Ballroom (Expo Center)
Y. Mohammed, K. Zhang (Old Dominion University), H. Baumgart (Old Dominion University, ECE Department), and A. A. Elmustafa (Old Dominion University)
Titanium oxides thin films are used in artificial heart valves due to their superb biocompatibility. They are used as photocatalysts in solar cells for the production of hydrogen and electric energy due to their stability, nontoxicity, and excellent photocatalytic properties [1]. TiO2 films are also used in heterogeneous catalysis, as a corrosion protective coating [2] and as electrode material in lithium rechargeable batteries. Above all TiO2 is utilized in massive amounts as white pigments in paints and toothpaste and cosmetic products.

It is reported that TiO2 exists in three different crystalline structures: rutile, anatase (both tetragonal) and brookite (rhombohedral). Many of the properties in these applications are strongly dependent on titanium oxide’s crystal morphology, surface area, and mechanical properties. TiO2 films of 500 nm thickness were synthesized using atomic layer deposition (ALD) on p-type Si (100). The films are tested for surface morphology, crystal structure and nanomechanical properties. The nanomechanical properties are tested using a nanoindenter from Keysight equipped with a three sided Berkovich diamond tip. The crystalline structure is verified using X-ray diffraction. The surface morphology is examined using atomic force microscopy (AFM) and the film thickness was verified using field emission scanning electron microscopy (FE-SEM) as indicated by the cross sectional FE-SEM image, shown in Figure 1.

We will discuss the structural and mechanical properties of the films citing the superiority of the ALD technique that is particularly used in the fabrication of the films that are presented in this study.

References

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  • Diebold, Surface Science reports, 48, 53 (2003).
  • X. Feng,G. Q.Xu, J. Lv,Q. M. Huang, Z. X. Zheng, andY. C.Wu, J. Electrochem. Soc, 160, H727 (2013).