Atomic layer deposition (ALD) is a gas phase deposition technique capable of fabricating thin films from a wide variety of materials. ALD utilizes alternating pulses of reactants that each undergo self-limiting reactions on the sample surface, producing uniform and conformal films, with good composition control and sub-nanometer thickness control. These features of ALD are particularly attractive for fabricating ORR catalysts in zinc-air battery electrodes, as they can lead to increased surface areas and three-phase boundary areas, both of which should lead to better performance and cyclability. In this study, ALD is used to produce air electrodes with Mn oxide as the ORR catalyst. The process is optimized and deposits are characterized using microstructural characterization (e.g., electron microscopy, X-ray diffraction, surface science techniques and Raman spectroscopy) and electrochemical characterization (e.g., linear sweep voltammetry, electrochemical impedance spectroscopy and galvanostatic cycling) methods. Successful materials are tested in two different battery configurations, i.e., a two electrode set-up and a three-electrode set-up where the ORR and OER reactions are decoupled. The three-electrode configuration limits the potential window to which each electrode is subjected, greatly improving stability and cyclability.