L. Gubler (Electrochemistry Laboratory, Paul Scherrer Institut), T. Nolte (Laboratory of Inorganic Chemistry, ETH Zürich, Electrochemistry Laboratory, Paul Scherrer Institut), and T. Nauser (Laboratory of Inorganic Chemistry, ETH Zürich)

E. L. Redmond (W. L. Gore & Associates, Inc.), M. Maruyama, W. K. Liu, and S. Cleghorn (W. L. Gore and Associate, Inc.)

N. S. Khattra, M. El Hannach, K. H. Wong, E. Kjeang (Simon Fraser University), and M. V. Lauritzen (Ballard Power Systems Inc.)

M. Yandrasits, M. Lindell, S. Hamrock, A. Komlev (3M Corporate Research Materials Lab), D. M. Peppin, G. M. Haugen (3M Electronics Materials Solutions Division), E. Fort (University of St. Thomas), and K. Kalstabakken (3M Corporate Research Analytical Lab)

F. D. Coms and A. B. McQuarters (General Motors)

C. J. Banas (Dept. of Mechanical Engineering, Univ. of Connecticut), M. T. A. Arman (Dept. Mechanical Engineering, Univ. of Connecticut), M. A. Uddin (Dept. of Mechanical Engineering, Univ. of Connecticut), J. Park, L. J. Bonville (University of Connecticut), and U. Pasaogullari (Dept. of Mechanical Engineering, Univ. of Connecticut)

A. Vassiliev, A. K. Reumert, J. O. Jensen, and D. Aili (Technical University of Denmark)