853
Evaluation of Stress Induced by Plasma Assisted ALD SiN Film

Monday, May 13, 2013: 11:40
Norfolk, Mezzanine Level (Sheraton)
Kohki Nagata, Master , Meiji University, Kawasaki, Japan
Masaya Nagasaka, Bachelor , Meiji University
Takuya Yamaguchi, Bachelor , Meiji University
Atsushi Ogura , Meiji University
Hiroshi Oji , Japan Synchrotron Radiation Research Institute
Jin-Young Son , Japan Synchrotron Radiation Research Institute
Ichiro Hirosawa , Japan Synchrotron Radiation Research Institute
Y. Watanabe , Tokyo Electron, Ltd.
Y. Hirota , Tokyo Electron, Ltd.

Abstract:

  • E5-0853 (111.0KB) - Abstract Text