Afternoon Session

Wednesday, May 15, 2013: 14:00-17:40
Windsor West, Mezzanine Level (Sheraton)
Chairs:
Stojan Djokic and Elizabeth J. Podlaha-Murphy
14:00
993
(Invited) Arresting Dendritic Growth Using Additives
Alaina Strickler, Case Western Reserve University; Uziel Landau, Case Western Reserve University
14:40
994
Tailoring Gold Plating for Thermal-Compression Bonding
Luca Magagnin, Politecnico di Milano; Pietro Luigi Cavallotti, Politecnico di Milano; Simona Ieffa, Politecnico di Milano
15:00
995
Impact of the Applied Potential on the Copper Nucleation
Elise Delbos, OMG Ultra Pure Chemicals; Hanane El Belghiti, OMG Ultra Pure Chemicals; Dimitri Mercier, University of Versailles UMR 8180-Institut Lavoisier de Versailles (78000) France; Jackie Vigneron, Institut Lavoisier de Versailles; Muriel Bouttemy, Institut Lavoisier de Versailles; Arnaud Etcheberry, Institut Lavoisier de Versailles
15:20
996
Spatially Resolved Studies of Copper Electroplating by Scanning Transmission X-Ray Microscopy
Zhisheng Qin, MSc, McMaster University; Vincent Lee, McMaster University; Adam P. Hitchcock, PhD, McMaster University
15:40
Break
16:00
997
Absorber Thin Films of Cu2ZnSnS4 From Chemically Deposited Binary Compounds
Maricela Rebeca Aragón-Silva, M. Sc., Universidad Nacional Autónoma de México; D. Becerra, Doctorate, Universidad Nacional Autónoma de México; M. T. S. Nair, Ph. D., Universidad Nacional Autónoma de México; P. K. Nair, Ph. D., Universidad Nacional Autónoma de México
16:20
998
Pulse Current Electrodeposition of Nanocatalysts Using Different Waveforms for Use in PEMFCs
Shahram Karimi, Ph.D., University of Toronto
16:40
999
Electrodeposition of Cobalt-Manganese Alloy Coatings Onto Metallic SOFC Interconnects
Heather McCrabb, Faraday Technology, Inc.; Savidra Lucatero, Faraday Technology, Inc.; Tim D Hall, Faraday Technology, Inc.; Stephen Snyder, Faraday Technology, Inc.; Burhanuddin Kagajwala, Faraday Technology, Inc.; Hui Zhang, West Virginia University; Xingbo Liu, West Virginia University; E. J. Taylor, Faraday Technology, Inc.
17:00
1000
Fabrication of SERS-Active Substrates by Electrochemical and Electroless Deposition of Metals in Macroporous Silicon
Ksenya Artsemyeva, Micro- and Nanoectronics Department, Belarusian State university of Informatics and Radioectronics; Hanna Bandarenka, Belarusian State University of Informatics and Radioelectronics; Andrei Panarin, NASB; Sergei Terekhov, NASB; Vitaly Bondarenko, Belarussian State University of Informatics and Radioelectronics
17:20
1001
Tungsten Hydroxide /Porous Silicon Composite Fabricated by the Liquid Phase Infiltration
Minoru Mizuhata, D. Sc., Kobe University; Yuki Mineyama, Kobe University; Takashi Hasegawa, Kobe University; Hideshi Maki, D. Sc., Kobe University
See more of: F2: Novel Design and Electrodeposition Modalities
See more of: Electrochemical/Chemical Deposition and Etching
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