2124
TiN Metal Hard Mask Removal with Selectivity to Tungsten and TiN Liner

Tuesday, October 29, 2013: 17:40
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Steven Lippy , Advanced Technology Materials Inc.
Li-Min Chen , Advanced Technology Materials Inc., Danbury, CT
Brown Peethala , IBM Albany
David L Rath , IBM Thomas J Watson Research Center
Karl Boggs , Advanced Technology Materials Inc.
Muthumanickam Sankarapandian , IBM Albany
Evelyn Kennedy , Advanced Technology Materials Inc.

Abstract:

  • E8-2124 (196.0KB) - Abstract Text
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