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Advanced Spectroscopic Ellipsometry Application for Multi-Layers SiGe at 28nm Node and Beyond

Tuesday, October 29, 2013: 09:10
Union Square 22, Tower 3, 4th Floor (Hilton San Francisco Union Square)
Teng-Chun Hsuan , United Microelectronics Corp. (UMC), Tainan, Taiwan
Yi-Cheng Hu , United Microelectronics Corp. (UMC)
Ming Chih Hsu , United Microelectronics Corp.
Dian-Zhen Zhan , United Microelectronics Corp. (UMC)
Stan Yu , United Microelectronics Corp. (UMC)
Chin-Cheng Chien , United Microelectronics Corp. (UMC)
Shao-Ju Chang , KLA-Tencor Corporation
Sheng-Min Chiu , KLA-Tencor Corporation
Chien-Jen Huang , KLA-Tencor Corporation
Chao-Yu Cheng , KLA-Tencor Corporation
Juli Cheng , KLA-Tencor Corporation
Getin Raphael , KLA-Tencor Corporation
Zhiming Jiang , KLA-Tencor Corporation
Ygartua Carlos , KLA-Tencor Corporation
Zhengquan Tan , KLA-Tencor Corporation
Ray Hoobler , KLA-Tencor Corporation

Abstract:

See more of: Ge and SiGe Channels
See more of: E10: Semiconductors, Dielectrics, and Metals for Nanoelectronics 11
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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