2172
Effect of Sputtering Pressure On the Electrical Characteristics of RF Magnetron Sputtering Processed Zinc Tin Oxide Thin Film Transistors

Tuesday, October 29, 2013
Grand Ballroom, Tower 2, Grand Ballroom Level (Hilton San Francisco Union Square)
Hong Woo Lee , Seoul National University, Seoul, South Korea
Bong Seob Yang , Seoul National University
Seungha Oh , Seoul National University
Sang Jin Han , Seoul National University
Hyeong Joon Kim , Seoul National University, Seoul, South Korea

Abstract:

See more of: E10 Poster Session
See more of: E10: Semiconductors, Dielectrics, and Metals for Nanoelectronics 11
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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