E10 Poster Session

Tuesday, October 29, 2013: 18:00-20:00
Grand Ballroom, Tower 2, Grand Ballroom Level (Hilton San Francisco Union Square)
Chairs:
Hemanth Jagannathan and Samares Kar
Development of an All-Wet-Etch Process Chemistry for the Patterning of Metal Conductors in Igzo Thin-Film-Transistors
Kurtis Leschkies, Ph.D., Applied Materials, Inc.; Steven Verhaverbeke, Applied Materials, Inc.; D. K. Yim, Applied Materials, Inc.; H. C. Hsu, Applied Materials, Inc.; H. Kim, Applied Materials, Inc.; R. Lim, Applied Materials, Inc.; J. M. White, Applied Materials, Inc.; Robert J. Visser, Applied Materials, Inc.
Extremely Large Refractive Indexes in Anodic Tantalum Pentoxide
Alina Kulpa, Ph. D., The University of British Columbia; Nicolas A. F. Jaeger, Ph. D., The University of British Columbia
High Quality SiGe:B of High Ge Layer for 14nm and Beyond FINFET Processes
Chin I Liao, PHD, United Microelectronics Corp.; Chun Yua Chen, PHD, United Microelectronics Corp.; Stan Yu, Master, United Microelectronics Corp.; Chin Cheng Chien, PHD, United Microelectronics Corp.; Chan Lon Yang, PHD, United Microelectronics Corp.; J Y Wu, Master, United Microelectronics Corp.; Balasubramanian Ramachandran, PHD, Applied Materials Inc.
Schottky Barrier Height between Erbium Silicide and Various Morphology of Si(100) Surface Changed by Alkaline Etching
Hiroaki Tanaka, Ph. D., Tohoku University; Akinobu Teramoto, Ph. D., Tohoku University; Shigetoshi Sugawa, Ph. D., Tohoku University; Tadahiro Ohmi, Ph. D., Tohoku University
 
2171
Photo-Bias Instability of Solution Processed Zinc Tin Oxide Thin Film Transistors With Varying Zn:Sn Composition Ratio (Cancelled)
 
2172
Effect of Sputtering Pressure On the Electrical Characteristics of RF Magnetron Sputtering Processed Zinc Tin Oxide Thin Film Transistors (Cancelled)
Electrodeposition and Characterization of ZnO Rods Films
Vanessa Nascimento dos Santos, Master, Instituto de Química de São Carlos; Sergio Antonio Spinola Machado, PhD, Instituto de Química de São Carlos
Effects of Non-Complexing Additives on Electrodeposited Cu(InGa)Se2 (CIGSe) Thin Film
Francisco Willian de Souza Lucas, Federal University of São Carlos; Lucia Helena Mascaro, Federal University of São Carlos
A Two-Step Electrical Degradation Behavior in α-InGaZnO Thin-Film Transistor
Tung-Ming Pan, Ph.D., Chang Gung University; Fa-Hsyang Chen, M.D., Chang Gung University; Ching-Hung Chen, Chang Gung University; Ching-Chang Lin, M.D., National Chiao Tung University; Chieh Cheng, National Chiao Tung University; Fu-Hsiang Ko, Ph.D., National Chiao Tung University; Wu-Hsiung Lin, Ph.D., AU Optronics; Po-Hsueh Chen, M.D., AU Optronics; Jim-Long Her, Ph.D., Chang Gung University; Yasuhiro H. Matsud, Ph.D., University of Tokyo
Improved Characteristics for Metal-nGaSb Ohmic Contact by Using Indium Gallium Zinc Oxide (IGZO)
Jeong-Hun Shin, graduated course, Sungkyunkwan University; Hyun-Wook Jung, graduated course, Sungkyunkwan University; Jin-Hong Park, Ph.D, Sungkyunkwan University