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High Quality SiGe:B of High Ge Layer for 14nm and Beyond FINFET Processes

Tuesday, October 29, 2013
Grand Ballroom, Tower 2, Grand Ballroom Level (Hilton San Francisco Union Square)
Chin I Liao, PHD , United Microelectronics Corp., Tainan, Taiwan
Chun Yua Chen, PHD , United Microelectronics Corp.
Stan Yu, Master , United Microelectronics Corp.
Chin Cheng Chien, PHD , United Microelectronics Corp.
Chan Lon Yang, PHD , United Microelectronics Corp.
J Y Wu, Master , United Microelectronics Corp.
Balasubramanian Ramachandran, PHD , Applied Materials Inc.

Abstract:

See more of: E10 Poster Session
See more of: E10: Semiconductors, Dielectrics, and Metals for Nanoelectronics 11
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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