VPD-DC-ICPMS Analysis Applied to the Characterization of Noble Metal Contamination: Implementation of a New Collection Solution

Wednesday, October 30, 2013: 11:00
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Marie Devita , STMicroelectronics, 850 Rue Jean Monnet, 38926 Crolles, France, Grenoble cedex 9, France
Hervé Fontaine , CEA, LETI, Grenoble, France
Nathalie Drogue , STMicroelectronics, 850 Rue Jean Monnet, 38926 Crolles, France
Daniel Mathiot , ICube laboratory (Université de Strasbourg and CNRS), 23 rue du Loess, 67037 Strasbourg cedex 2, France
Dominique Despois , STMicroelectronics, 850 Rue Jean Monnet, 38926 Crolles, France
Virginie Enyedi , CEA, LETI, MINATEC Campus, 17 rue des martyrs, 38054 Grenoble cedex 9, France

Abstract:

See more of: Metallic Contamination Analysis
See more of: E8: Semiconductor Cleaning Science and Technology 13 (SCST 13)
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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