Metallic Contamination Analysis

Wednesday, October 30, 2013: 11:00-11:50
Continental 8, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Chairs:
Takeshi Hattori and Jerzy Ruzyllo
 
VPD-DC-ICPMS Analysis Applied to the Characterization of Noble Metal Contamination: Implementation of a New Collection Solution (Cancelled)
11:00
2135
Trace Metal Analysis of Cleanroom Dry Wipers by Inductively Coupled Plasma – Mass Spectrometry
Shi Liu, ChemTrace Analytical Services; Bin Liu, ChemTrace Analytical Services
11:20
2136
Quantitative Analysis of the Metallic Contamination On GaAs and InP Wafers by TXRF and ICPMS Techniques
Hervé Fontaine, CEA, LETI; Thierry Lardin, CEA Leti
11:40
Concluding Remarks
See more of: E8: Semiconductor Cleaning Science and Technology 13 (SCST 13)
See more of: Dielectric and Semiconductor Materials, Devices, and Processing
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