1952
Abrasive-Free Polishing of SiC Wafer Utilizing Catalyst Surface Reaction

Thursday, October 31, 2013: 11:00
Continental 9, Tower 3, Ballroom Level (Hilton San Francisco Union Square)
Yasuhisa Sano , Osaka University, Osaka, Japan
Kenta Arima , Osaka University
Kazuto Yamauchi , Osaka University

Abstract:

  • E3-1952 (128.0KB) - Abstract Text
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